Special Issue on ‘Atomic Layer Processes for Emerging Applications’
Guest Editors Prof. Rong Chen Huazhong University of Science and Technology rongchen@ hust.edu.cn Prof. Xinwei Wang Peking University Shenzhen Graduate School wangxw@pkusz.edu.cn Prof. Fan Yang Huazhong University of Science and Technology fan_yang@hust.edu.cn |
Introduction
Atomic and close-to-atomic scale manufacturing (ACSM) is the leading trend of future manufacturing development. Understanding the unique behaviors, manufacturing mechanisms at the atomic scale and developing new methods, equipment and instruments is vital for the ACSM process. Atomic layer deposition (ALD) as an atomic-level bottom-up and surface sensitive functionalization ASCM technique, has drawn more and more attentions during the recent years. The chemical, conformal, self-limiting and accuracy characteristics of ALD are now leading the booming of optical, electronic, energetic, catalytic mechanical as well as other emerging novel functional devices, applications and systems.
The aim of this special theme is to provide a forum for researchers and practitioners to present and review the state-of-the-art development, premier challenges and foresight visions in ACSM, with an emphasis on ALD fundamentals, new processes, new tools and new applications. ACSM parameters with atomic scale, atomic precision, large area, complex geometry and high performance particularly with ALD, are highly preferred.
Possible topics, within this scope, include but are not limited to:
Emerging and novel applications of atomic and close-to-atomic scale manufacturing
New ALD processes and precursors for emerging applications
Simulation, modeling, and theory of new growth
Characterizations and in-situ analysis during ALD growth
Plasma and other energy-enhanced ALD methods
Spatial atomic layer deposition for large-scale and mass production
Atomic layer etching process and fabrication
Applications in sensors
Applications in optics and displays
Applications in flexible and organic electronics
Applications in energy storage and catalysis
Applications in medical and biological systems
Applications in environment remediation
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Atomic layer deposition to heterostructures for application in gas sensors
2023, 5(2): 022008 doi: 10.1088/2631-7990/acc76d
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Atomic layer deposition of thin films: from a chemistry perspective
2023, 5(3): 032003 doi: 10.1088/2631-7990/acd88e
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